• Optical lithography has been a key enabler of Moore’s Law, delivering approximately a 0.7× one dimensional node on node shrink for several decades and enabling integrated circuits that fuel today’s AI-driven computing. This presentation reviews key drivers of the electronics industry and the role of optical lithography in IC manufacturing, highlighting scaling through wavelength reduction, increased numerical aperture (NA), and operation near the physical imaging limit (low k1). Recent results of extreme ultraviolet (EUV) lithography using 13.5 nm light and 0.55 NA, capable of printing 8 nm lines and spaces, are presented. The scanner roadmap is complemented by metrology and computational lithography, together termed holistic lithography, in which sensors play a critical role.

  • Odors carry rich information about materials, environments, biological states, and human activities, yet they remain among the most challenging targets for sensor science and engineering. This talk will introduce the principles of olfactory sensors, also known as electronic noses (E-noses), and review more than four decades of research and development in the field, with particular attention to the intrinsic difficulty of sensing dilute, complex, and dynamic gas mixtures. As a case study, our interdisciplinary work on olfactory sensing using nanomechanical Membrane-type Surface stress Sensor (MSS) technology covers mechanical optimization, receptor materials, and AI-driven data analysis.

  • The human body poses one of the most challenging environments for sensors.  Its dynamic, responsive environment encompasses a complex interplay of biological, chemical, and mechanical factors that threaten sensor interface stability and longevity.